journal of micro nanolithography mems and moems
VOL. 17 · NO. 2 | April 2018
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 17(2), 020101 (3 May 2018) https://doi.org/10.1117/1.JMM.17.2.020101
TOPICS: Stochastic processes, Lithography, Optical lithography, Photons, Molecules, Semiconductors, Materials processing, Metrology, Etching, Extreme ultraviolet lithography
Review Articles
J. Micro/Nanolith. MEMS MOEMS 17(2), 020901 (27 April 2018) https://doi.org/10.1117/1.JMM.17.2.020901
TOPICS: Reticles, Semiconductors, Sensors, Microelectronics, Manufacturing, Air contamination, Semiconductor manufacturing, Metals, Semiconducting wafers, Electric field sensors
Lithography
J. Micro/Nanolith. MEMS MOEMS 17(2), 023501 (11 April 2018) https://doi.org/10.1117/1.JMM.17.2.023501
TOPICS: Projection systems, Lithography, Optical components, Optimization (mathematics), Thermal modeling, Refractive index, Photomasks, Optical design, Lithographic illumination, Thermography
Ling Ma, Qiang Wu, Lisong Dong, Qiaoqiao Li, Yayi Wei, Tianchun Ye
J. Micro/Nanolith. MEMS MOEMS 17(2), 023502 (23 April 2018) https://doi.org/10.1117/1.JMM.17.2.023502
TOPICS: Semiconducting wafers, Particles, Optical lithography, Nitrogen, Photomasks, Semiconductor manufacturing, Lithium, Lithography, Fluid dynamics, Photoresist materials
J. Micro/Nanolith. MEMS MOEMS 17(2), 023503 (28 April 2018) https://doi.org/10.1117/1.JMM.17.2.023503
TOPICS: Calibration, Data modeling, Process modeling, Autoregressive models, Lithography, Photomasks, Statistical modeling, Monte Carlo methods, Photoresist processing, Optical proximity correction
Jiyeah Rhie, Dukhyung Lee, Young-Mi Bahk, Jeeyoon Jeong, Geunchang Choi, Youjin Lee, Sunghwan Kim, Seunghun Hong, Dai-Sik Kim
J. Micro/Nanolith. MEMS MOEMS 17(2), 023504 (3 May 2018) https://doi.org/10.1117/1.JMM.17.2.023504
TOPICS: Photoresist materials, Etching, Scanning electron microscopy, Metals, Atomic layer deposition, Ion beams, Chromium, Photomasks, Gold, Lithography
J. Micro/Nanolith. MEMS MOEMS 17(2), 023505 (10 May 2018) https://doi.org/10.1117/1.JMM.17.2.023505
TOPICS: Absorption, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Tin, Zirconium, Metals, Lithography, Oxides, Chemical elements
Metrology
Tien-Chan Chang, Chun-An Liao, Zhi-Yu Lin, Yiin-Kuen Fuh
J. Micro/Nanolith. MEMS MOEMS 17(2), 024001 (10 April 2018) https://doi.org/10.1117/1.JMM.17.2.024001
TOPICS: Composites, Graphene, Interfaces, Thermal effects, Field effect transistors, Anisotropy, Electronic components, Raman spectroscopy, Particles, Transmission electron microscopy
Microelectromechanical systems (MEMS)
Yuying Chiang, Chingfu Tsou, Bi-Chang Chen, Ruey-Hwang Chou
J. Micro/Nanolith. MEMS MOEMS 17(2), 025001 (12 April 2018) https://doi.org/10.1117/1.JMM.17.2.025001
TOPICS: Electrodes, Luminescence, Lung cancer, Microscopes, Diffusion, Cancer, Glasses, Image processing, Solids, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 17(2), 025002 (14 May 2018) https://doi.org/10.1117/1.JMM.17.2.025002
TOPICS: Microfluidics, 3D printing, Printing, Finite element methods, Computer aided design, Synthetic aperture radar, Numerical simulations, 3D modeling, Chemical analysis, Diffusion
Micro-optoelectromechanical systems (MOEMS)
Matthew Hamblin, Thane Downing, Sophia Anderson, Erik Hamilton, Doyoung Kim, Aaron Hawkins
J. Micro/Nanolith. MEMS MOEMS 17(2), 025501 (23 April 2018) https://doi.org/10.1117/1.JMM.17.2.025501
TOPICS: Antireflective coatings, Reflectivity, Coating, Silicon, Reflection, Liquids, Thin films, Etching, Polishing, Absorption
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