17 May 2017 Effective–CD: a contribution toward the consideration of line edge roughness in the scatterometric critical dimension metrology
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J. of Micro/Nanolithography, MEMS, and MOEMS, 16(2), 024002 (2017). doi:10.1117/1.JMM.16.2.024002
Abstract
We present an overview of our research on the relation between line edge roughness (LER) and optical critical dimension metrology (OCD). Referring to a known fact that LER does have an impact on OCD, we discuss a novel approach that allows for its better understanding. Namely, we show that, in the presence of LER, one can observe a characteristic scatterometry-measured CD offset, which we call effective–CD. The fact that the effective–CD is characteristic renders it to be a good means of accessing the information about LER present on the CD. To assure the completeness of this overview, we begin by reviewing some previously published results, which have drawn our attention and first led us to observing the characteristic influence of LER on a CD measurement. Next, we extend our model-based simulations to confirm the presence of the effective–CD for complex-roughness models, and finally, we demonstrate an experimental verification of our effective–CD hypothesis. We are convinced that our approach will help to better understand the impact of LER on a CD measurement and will be considered a useful contribution to the development of measurement methods for challenging scenarios, in which realistic CD is affected by the presence of LER.
Bartosz Bilski, Karsten Frenner, Wolfgang Osten, "Effective–CD: a contribution toward the consideration of line edge roughness in the scatterometric critical dimension metrology," Journal of Micro/Nanolithography, MEMS, and MOEMS 16(2), 024002 (17 May 2017). http://dx.doi.org/10.1117/1.JMM.16.2.024002 Submission: Received 23 June 2016; Accepted 21 February 2017
Submission: Received 23 June 2016; Accepted 21 February 2017
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KEYWORDS
Critical dimension metrology

Line edge roughness

Model-based design

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